Πλοήγηση ανά Θέμα "Reactive sputter deposition"

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    • Article  

      Active process control of reactive sputter deposition 

      Voevodin, A. A.; Stevenson, P.; Rebholz, Claus; Schneider, J. M.; Matthews, A. (1995)
      Control of the density, composition, ionisation rate and arrival energy of species is one of the main objectives of research in the development of reactive magnetron sputtering. The deposition of the latest generation of ...